Densification And Properties Of Fluorine Doped Tin Oxide (Fto) Ceramics By Spark Plasma Sintering

Meijuan Li,Kun Xiang,Qiang Shen,Lianmeng Zhang
DOI: https://doi.org/10.1002/9781118771327.ch6
2014-01-01
Abstract:Fluorine doped tin oxide (FTO) has been recognized as a very promising transparent conductive material which is used in a wide range of devices. For the preparation of high quality FTO thin film by magnetron sputtering or pulse laser deposition (PLD) technique, full dense FTO target materials are fabricated. The FTO powders (fluorine concentration is set according to the mole ratio of [F]/[Sn]= 0.1 similar to 0.3) are synthesized and then annealed at 400 degrees C to ensure the doping fluorine into the tin oxide lattice. And nearly full-densified FTO ceramics are sintered via spark plasma sintering (SPS). During the rapid sintering process, the limited vaporization of fluorides is beneficial to the sintering of tin oxide by vapor transport, while it brings about only few pores in the sinters. The relative density of SPS sintered FTO ceramics can be higher than 98.5% of the theoretical density when the samples are sintered at 850 similar to 900 degrees C. The microstructures observed by scanning electronic microscope illustrate that the grain growth in SPS as-sintered FTO ceramics is obvious. These results contribute to a relative low electrical resistivity of 0.012 Omega.cm and high hall mobility of 15 cm(2)/(Vs) for FTO ceramics.
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