Abstract:A double-layer metal superlens was rigorously analyzed and systematically designed to improve subwavelength imaging ability. It was revealed that transmission properties of the imaging system could be accurately interpreted by the five-layer waveguide mode theory—each amplification peak among the spatial frequency range of evanescent waves was associated with a corresponding surface plasmon polariton (SPP) mode of an insulator-metal-insulator-metal-insulator (IMIMI) structure. On the basis of such physical insight, evanescent waves of higher spatial frequency were effectively amplified via increasing propagation constants of symmetrically coupled short-range SPP (s-SRSPP) and antisymmetrically coupled short-range SPP (a-SRSPP), and evanescent waves of lower spatial frequency were appropriately diminished by approaching to cut off symmetrically coupled long-range SPP (s-LRSPP). A flat and broad optical transfer function of the imaging system was then achieved, and improved subwavelength imaging performance was validated by imaging an ideal thin object of two slits with a 20-nm width distanced by a 20-nm spacer, under 193-nm illumination. The resolution limit of the designed imaging system with double-layer superlens was further demonstrated to be at least ~λ/16 for an isolated two-slit object model. This work provided sound theoretical analysis and a systematic design approach of double-layer metal superlens for near-field subwavelength imaging, such as fluorescent micro/nanoscopy or plasmonic nanolithography.

Image distance shift effect of the metal superlens and its applications to photolithography

Loss and Back-Coupling Effects on Subwavelength Imaging of Three-Dimensional Superlens.

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Near Field Coupling And Its Application To Plasmonic Devices

Superlens-enhanced Laser Interference Lithography

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Localizing surface plasmons with a metal-cladding superlens for projecting deep-subwavelength patterns

Sub-diffraction-limited Interference Photolithography with Metamaterials

Influence of V-Shaped Metallic Subwavelength Slits with Variant Periods for Superfocusing

A Super Lens System for Demagnification Imaging Beyond the Diffraction Limit

Research on Superlenses Breaking Through the Diffraction-Limited and Its Applications

Optical superlens imaging system for near field nanolithography

Demagnification Imaging Improved by Mask in a Hyperlens Photolithography System

Revolutionary Meta-Imaging: from Superlens to Metalens

Exploring the Superfocusing Performance of Plasmonic Lenses Formed by Coupled Nanoslits

Research on inspection method of metalens based on phase-shifting interference

Plane demagnifying nanolithography by hybrid hyperlens–superlens structure

Rigorous Analysis and Systematical Design of Double-Layer Metal Superlens for Improved Subwavelength Imaging Mediated by Surface Plasmon Polaritons

Interference Photolithography with Metamaterials