Hydrothermal Epitaxial Growth And Nonvolatile Bipolar Resistive Switching Behavior Of Lafeo3-Pbtio3 Films On Nb:Srtio3(001) Substrate

pingxiang zhang,c x gao,fang lv,y p wei,c h dong,c l jia,q f liu,d s xue
DOI: https://doi.org/10.1063/1.4898337
IF: 4
2014-01-01
Applied Physics Letters
Abstract:Epitaxial LaFeO3-PbTiO3 (LFPTO) thin films were hydrothermally grown on the Nb-SrTiO3 (100) (NSTO) substrates with a thickness about 250 nm. As fabricated Pt/LFPTO/NSTO/Pt devices exhibit reversible bipolar resistive switching behavior. The resistance ratios between high resistance state and low resistance state exceed three orders of magnitude, which can be maintained over 6 h without observable degradation. It indicates that the Pt/LFPTO/NSTO/Pt devices reveal excellent data retention and endurance characteristics. The resistive switching mechanism of the device could be attributed to the trap-controlled space-charge-limited current conduction which is controlled by the localized oxygen vacancies in the films. Furthermore, variation of Pt/LFPTO Schottky junction depletion thickness and barriers height modulated by oxygen vacancies at Pt/LFPTO interface was suggested to be responsible for the resistance switching behaviors of the devices. (C) 2014 AIP Publishing LLC.
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