Oxygen Related Recombination Defects in Ta3n5 Water Splitting Photoanode

Gao Fu,Shicheng Yan,Tao Yu,Zhigang Zou
DOI: https://doi.org/10.1063/1.4934758
IF: 4
2015-01-01
Applied Physics Letters
Abstract:A key route to improving the performance of Ta3N5 photoelectrochemical film devices in solar driving water splitting to hydrogen is to understand the nature of the serious recombination of photo-generated carriers. Here, by using the temperature-dependent photoluminescence (PL) spectrum, we confirmed that for the Ta3N5 films prepared by nitriding Ta2O5 precursor, one PL peak at 561 nm originates from deep-level defects recombination of the oxygen-enriched Ta3N5 phases, and another one at 580 nm can be assigned to band recombination of Ta3N5 itself. Both of the two bulk recombination processes may decrease the photoelectrochemical performance of Ta3N5. It was difficult to remove the oxygen-enriched impurities in Ta3N5 films by increasing the nitriding temperatures due to their high thermodynamically stability. In addition, a broadening PL peak between 600 and 850 nm resulting from oxygen related surface defects was observed by the low-temperature PL measurement, which may induce the surface recombination of photo-generated carriers and can be removed by increasing the nitridation temperature. Our results provided direct experimental evidence to understand the effect of oxygen-related crystal defects in Ta3N5 films on its photoelectric performance.
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