Enhancement of the Anomalous Hall Effect in Ni Thin Films by Artificial Interface Modification

Jianli Xu,Yufan Li,Dazhi Hou,Li Ye,Xiaofeng Jin
DOI: https://doi.org/10.1063/1.4802484
IF: 4
2013-01-01
Applied Physics Letters
Abstract:The enhancement of the anomalous Hall effect has been realized by capping one monolayer Cu on Ni thin films. This approach with artificial interface engineering is proved to be an effective way to improve spin to charge transformation and may have potential application in spintronics.
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