Compromise of Electrical Leakage and Capacitance Density Effects: a Facile Route for High Mobility and Sharp Subthreshold Slope in Low-Voltage Operable Organic Field-Effect Transistors

Wentao Xu,Shi-Woo Rhee
DOI: https://doi.org/10.1039/c0jm02401e
2010-01-01
Journal of Materials Chemistry
Abstract:The effects of electrical leakage and capacitance density were investigated in the low-voltage operated organic field-effect transistors (OFETs) by using a gate dielectric with a bi-layer structure of atomic layer deposited alumina (ALD-Al2O3) and high-k polymeric cyanoethylated pullulan (CEP) layer. A significant improvement in the device performance was achieved by compromising the two effects, suppressing the leakage current with ALD-Al2O3 dielectric and maintaining the high capacitance with high-k polymeric layer. With the optimized thickness of ∼5 nm alumina (Ci,CEP/Al2O3 ∼ 85 nF cm−2), a high mobility of ∼5 cm2 V−1s−1 and sharp subthreshold slope (SS) of 0.066 V dec−1 were obtained. The smoother surface of the polymeric dielectric surface enhanced the 2-dimensional vertical molecular layer growth and contributed to the better device performance.
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