Revisiting The Low-Temperature Dielectric Properties Of Zno

chunchang wang,lina liu,qiuju li,shouguo huang,jian zhang,jun zheng,chao cheng
DOI: https://doi.org/10.1063/1.4896065
IF: 2.877
2014-01-01
Journal of Applied Physics
Abstract:Electric modulus spectroscopy and impedance analysis were used to investigate the low-temperature (similar to 100-333 K) dielectric properties of ZnO crystals. Two relaxations were observed. The low-temperature relaxation (R1) features a thermally activated behavior resulting from the bulk response. Our results convincingly demonstrate that this relaxation is a polaronic relaxation. The relaxing species for R1 are localized holes created by zinc vacancies instead of the commonly agreed oxygen vacancies. The high-temperature relaxation (R2) is a Maxwell-Wagner relaxation due to skin-layer effect as it can be eliminated by grinding off the sample surface. The inhomogeneous distribution of zinc interstitials leads to the formation of the skin layer. Interestingly, an abnormal dielectric behavior contrary to the thermally activated behavior was found for the R2 relaxation. This abnormal behavior was confirmed to be related to the positive temperature coefficient of resistance due to the metal-insulator transition occurring within the skin layer. (C) 2014 AIP Publishing LLC.
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