Energy-Level Alignment at the Alq(3)/Fe3o4(001) Interface

A. Pratt,L. Dunne,X. Sun,M. Kurahashi,Y. Yamauchi
DOI: https://doi.org/10.1063/1.3677768
IF: 2.877
2012-01-01
Journal of Applied Physics
Abstract:We have used the technique of metastable de-excitation spectroscopy to probe the interfacial electronic structure of the organic semiconductor (OSC) Alq(3) deposited onto clean Fe3O4(001) substrates. We have measured shifts in the low-energy secondary electron cutoff and energetic onset of the highest occupied molecular orbital (HOMO) of Alq(3) as the coverage increases from the sub-ML range to multilayer formation. We find that the presence of an interfacial dipole induces a uniform decrease in the valence band electronic states by 1.2 eV with respect to the vacuum level and modifies the position of the HOMO energetic onset to 1.8 eV below the substrate Fermi level. The strong intrinsic dipole moment of Alq(3) is suggested as the origin for these changes in accordance with previous studies of Alq(3) deposited onto various substrates. (C) 2012 American Institute of Physics. [doi:10.1063/1.3677768]
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