Polarity Determination for GaN/AlGaN/GaN Heterostructures Grown on (0001) Sapphire by Molecular Beam Epitaxy

YS Park,HS Lee,JH Na,HJ Kim,SM Si,HM Kim,TW Kang,JE Oh
DOI: https://doi.org/10.1063/1.1581375
IF: 2.877
2003-01-01
Journal of Applied Physics
Abstract:In order to study the formation of polarization-induced two-dimensional electron gases (2DEGs), GaN/AlGaN/GaN heterostructures with different polarity were grown on sapphire (0001) substrates by plasma-assisted molecular-beam epitaxy. The polarity of GaN layers can be changed from the normal N-polarity to a Ga-polarity surface by inserting a thin Al metal layer prior to the growth of AlN buffer layer. The surface stability of each lattice polarity film was studied by in situ reflection high-energy electron diffraction. The polarity of the films and the location of 2DEGs in the heterostructure have been evaluated by investigating the carrier concentration profiles in the GaN/AlGaN/GaN heterostructures. A simple model to explain the polarity change by a thin Al metal layer is proposed.
What problem does this paper attempt to address?