Multi-scale Quantum Point Contact Model for Filamentary Conduction in Resistive Random Access Memories Devices

Xiaojuan Lian,Xavier Cartoixa,Enrique Miranda,Luca Perniola,Riccardo Rurali,Shibing Long,Ming Liu,Jordi Sune
DOI: https://doi.org/10.1063/1.4885419
IF: 2.877
2014-01-01
Journal of Applied Physics
Abstract:We depart from first-principle simulations of electron transport along paths of oxygen vacancies in HfO2 to reformulate the Quantum Point Contact (QPC) model in terms of a bundle of such vacancy paths. By doing this, the number of model parameters is reduced and a much clearer link between the microscopic structure of the conductive filament (CF) and its electrical properties can be provided. The new multi-scale QPC model is applied to two different HfO2-based devices operated in the unipolar and bipolar resistive switching (RS) modes. Extraction of the QPC model parameters from a statistically significant number of CFs allows revealing significant structural differences in the CF of these two types of devices and RS modes.
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