Novel Ingapbi Single Crystal Grown by Molecular Beam Epitaxy
Li Yue,Peng Wang,Kai Wang,Xiaoyan Wu,Wenwu Pan,Yaoyao Li,Yuxin Song,Yi Gu,Qian Gong,Shumin Wang,Jiqian Ning,Shijie Xu
DOI: https://doi.org/10.7567/apex.8.041201
IF: 2.819
2015-01-01
Applied Physics Express
Abstract:InGaPBi crystalline thin films with up to 2.1% bismuth concentration have been grown on GaAs substrates by molecular beam epitaxy. Rutherford backscattering spectrometry confirms that the majority of Bi atoms are located at substitutional lattice sites. The films exhibit good surface, structural, and interface quality, and their strains can be tuned from tensile to compressive by increasing the Bi content. InBi LO and GaBi LO vibrational modes in Raman spectroscopy were observed, and their intensities increased with Bi concentration. A weak photoluminescence signal was observed at 1.78 eV at room temperature for the sample with a Bi content of 0.5%. (C) 2015 The Japan Society of Applied Physics