Single-mode and Wavelength Tunable Lasers Based on Deep-Submicron Slots Fabricated by Standard UV-lithography

Tingting Yu,Li Zou,Lei Wang,Jian-Jun He
DOI: https://doi.org/10.1364/oe.20.016291
IF: 3.8
2012-01-01
Optics Express
Abstract:By reversing the pillars formed on SiO2 mask sidewalls, it is possible to fabricate deep-submicron slots with width down to 240nm by standard UV-lithography. Based on this newly developed process, a single-mode slotted Fabry-Perot laser and a wavelength tunable laser with periodically distributed slots are designed, fabricated and characterized. Numerical analysis shows the low-loss advantage of deep-submicron slots. Experimentally, the slotted Fabry-Perot laser showed a low threshold current of 22mA and the tunable slotted grating laser exhibited a maximum side mode suppression ratio (SMSR) of 43dB and a discretely tuning range of about 38nm. The method has excellent potential for low cost fabrication of photonic devices with deep-submicron features without using expensive tools such as the e-beam lithography.
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