Structure and mechanical properties of toughening B1 Ta1-xMoxN films with various Mo contents

Hang Li,Jianliang Li,Jian Kong,Jiewen Huang,Qiujie Wu,Dangsheng Xiong
DOI: https://doi.org/10.1016/j.ceramint.2023.02.179
IF: 5.532
2023-06-01
Ceramics International
Abstract:In this paper, Ta1-xMoxN films with varying Mo contents were deposited by reactive magnetrons sputter in mixed Ar/N2 atmospheres at 350 °C. It's discovered that Ta1-xMoxN films at x = 0.13–0.86 maintains a NaCl type (B1) structure and a strong (200) preferred orientation. Besides, as Mo contents grow, the residual stress of films is attenuated from −3.24 GPa to −1.49 GPa, and the hardness of films first increases and then decreases. Specifically, with a nearly balanced Ta and Mo content (x = 0.57), the Ta1-xMoxN film exhibits higher hardness (39.5 ± 1.2 GPa) and elastic modulus (359.3 ± 8.8 GPa), up by 53.1% and 26.8% compared with TaN, higher fracture toughness, scratch critical load (91.5 N) and elasticity (76.7%). The Ta1-xMoxN film with x = 0.57 obtains lower coefficient of friction (0.417), and higher wear resistance (wear rate: 1.9 × 10−7 mm3/N*m). In addition, the density of states (DOS) in XPS valence band spectra from Ta1-xMoxN films is shifted toward lower binding energy with more Mo contents. Accordingly, the stronger metallic characteristics and the solid solution strengthening effect endow the Ta1-xMoxN films at x = 0.57 with higher hardness and toughness.
materials science, ceramics
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