Reclamation of waste mixture of sulfuric acid and hydrogen peroxide used to clean semiconductor wafers

Y. Inagaki,M. Nishizaki

DOI: https://doi.org/10.1109/ISSM.1999.808787

1999-10-11

Abstract:The mixture of sulfuric acid and hydrogen peroxide, or the so-called piranha, used to clean semiconductor wafers generally requires considerable water and chemicals to allow it to be discharged as wastewater and sludge. We have developed a new method of converting the waste mixture into concentrated sulfuric acid, decomposing the hydrogen peroxide in the waste mixture and adding a trace of nitric acid. This method allows the waste mixture to be reused and the amount of water and chemicals required for treating the waste to be reduced.

Materials Science,Environmental Science,Engineering,Chemistry