The removal of fluosilicic acid ions in acid wastewater silicon etched by potassium salt

Ruihong Gao,Bing Huang,Huiwen Zheng
DOI: https://doi.org/10.1088/1755-1315/170/5/052007
2018-07-01
IOP Conference Series: Earth and Environmental Science
Abstract:A Silicon material is widely used in various industries, especially in the field of aerospace and solar energy. But a lot of acidic wastewater from silicon etched is produced by machining process of silicon core during polysilicon production process of modified Siemens process, which contains nitric acid, flu silicic acid, and hydrofluoric acid. The waste acid will cause environmental pollution. This research developed a way to make a chemical precipitation reaction of fluorosilicic acid, with precipitant (potassium nitrate, potassium sulphate) in the waste acid. The dilute nitric acid filtrate non-fluorinated is gotten after filtrated the precipitate. The results showed: (1) Potassium nitrate as precipitating agent, the remove flu silicic acid in waste acid and the utilization of the metal ion is the maximum;( 2) The optimal precipitant is potassium nitrate.
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