Abstract:Two-dimensional (2D) diffractive gratings offer a polarization-independent coupling solution between optical fibers and photonic integrated circuits, with advantages including placement flexibility, ease of fabrication, and tolerance to alignment errors. In this work, we proposed and experimentally demonstrated a highly efficient 2D grating coupler fabricated with 193-nm deep-ultraviolet (DUV) lithography on the 220-nm silicon-on-insulator (SOI) platform. An experimental peak coupling efficiency of -2.54 dB can be obtained using a minimum feature size of 180 nm, relying on the novel double-layer 2D grating structure. The proposed 2D waveguide grating is composed of a 70-nm shallow-etched hole array and a 160-nm-thick deposited polycrystalline silicon tooth array. The demonstrated design exhibits a 3-dB bandwidth of 23.4 nm with good positioning tolerance for optical fibers. Due to the benefits of perfectly vertical coupling configuration, the measured polarization-dependent loss in experiments is below 0.3 dB within the 3-dB working bandwidth. Our proposed double-layer 2D gratings can also be applied to other integrated optics platforms, where the grating directionality can be enhanced by optimizing the front-end-of-line process to break the vertical symmetry, thus enabling an efficient and polarization-independent coupling between optical fibers and photonic chips.

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