A General Route Towards Defect and Pore Engineering in Graphene

Guibai Xie,Rong Yang,Peng Chen,Jing Zhang,Xuezeng Tian,Shuang Wu,Jing Zhao,Meng Cheng,Wei Yang,Duoming Wang,Congli He,Xuedong Bai,Dongxia Shi,Guangyu Zhang
DOI: https://doi.org/10.1002/smll.201303671
IF: 13.3
2014-01-01
Small
Abstract:Defect engineering in graphene is important for tailoring graphene's properties thus applicable in various applications such as porous membranes and ultra-capacitors. In this paper, we report a general route towards defect- and pore- engineering in graphene through remote plasma treatments. Oxygen plasma irradiation was employed to create homogenous defects in graphene with controllable density from a few to ≈10(3) (μm(-2)). The created defects can be further enlarged into nanopores by hydrogen plasma anisotropic etching with well-defined pore size of a few nm or above. The achieved smallest nanopores are ≈2 nm in size, showing the potential for ultra-small graphene nanopores fabrication.
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