Fabrication of Polarization-Dependent Light Attenuator in Fused Silica Using a Low-Repetition-rate Femtosecond Laser.

Fangteng Zhang,Yongze Yu,Chen Cheng,Ye Dai,Jianrong Qiu
DOI: https://doi.org/10.1364/ol.38.002212
2013-01-01
Abstract:In this Letter, we have demonstrated the direct writing of polarization-dependent light attenuator inside fused silica by tailoring 1 kHz femtosecond (fs) laser induced self-organized nanogratings. Optical birefringence was observed to vary with the polarization plane azimuth of the fs laser and scanning direction. The formation of self-organized nanogratings was confirmed by scanning electron microscopy observation. A polarization-dependent light attenuator was fabricated by forming a plane consisting of nanograting lines inside fused silica by scanning the fs laser. The attenuation efficiency was improved by forming a multilayer nanograting structure. The technique may find important applications in micro-optical devices. (C) 2013 Optical Society of America
What problem does this paper attempt to address?