Abstract:A vertically aligned Ag nanowire‐embedded Si (or Ge) metamaterial with an infrared high refractive index neff is proposed, which is fabricated through a magnetron co‐sputtering method. Owing to the strong capacitive coupling and suppressed diamagnetic response present in the nanocavities, an ultrahigh neff (≈7.2) along with broadband low dispersion and low‐loss characters is generated, which promises to be applied in various nanophtonic devices. To open new vistas for designing nanophotonic systems, exploiting high refractive index (RI) availability is now drawing attention worldwide, especially in the visible‐infrared range. Based upon the nanoscale close‐packed arrangement of metallic nano‐units, few optical‐frequency metamaterials with high RIs have been demonstrated. However, there are still significant challenges in their RI promotion, tuneability, and integrated preparation for practical applications. Herein, a novel Ag nanowire‐based metamaterial scheme is put forward, in which vertically aligned Ag nanowire (NW) array embedded‐Si or ‐Ge composites are made. Thanks to flexible control on microstructure parameters of Ag NWs (meta‐unit) and their dielectric environment, the synergistic effect of enhanced capacitive coupling and weakened diamagnetic response is created, leading to a recorded near‐infrared high‐RI of ≈7.2, low‐dispersion from 2 to 10 μm, and customizable RIs. Further, an air nanohole array‐Si composite layer, acting as an impedance matching layer, is utilized to realize the transmittance increase of the metamaterial film by ≈50% at specific wavelengths, along with the bulk plasmon‐polariton (BPP) modes resonances in the interwire nanocavities. This approach to increasing the infrared refractive index can circumvent physical effect conflict in high RI metamaterials and pave a basis for future scalable and on‐demand photonic applications.

Nanorings and nanocrescents formed via shaped nanosphere lithography: a route toward large areas of infrared metamaterials.

Fabrication of porous microrings via laser printing and ion-beam post-etching

Wafer-Scale Fabrication of Metal Nanoring and Nanocrescent Arrays from Nanoimprinted Nanopillar Arrays

Multiple-Patterning Nanosphere Lithography for Fabricating Periodic Three-Dimensional Hierarchical Nanostructures.

Nanoring Formation By Direct-Write Inorganic Electron-Beam Lithography

Versatile Nanoring Fabrication Assisted by Hole-mask Colloidal Lithography

Optical Metamaterials at Near and Mid-Ir Range Fabricated by Nanoimprint Lithography

Large Area Nanohole Arrays for Sensing Fabricated by Interference Lithography

Optical Device Based on a Nanopillar Array by the Pattern Transfer of an Anodic Aluminum Oxide Membrane

Fabrication of Metal Nanoscale Devices on Insulating Membranes by High-Resolution Atom Ablation

Vertically‐Aligned Ag Nanowire Array‐Based Metamaterial with High Refractive Index and Low‐Dispersion in the Infrared Band

Fabrication and Characterization of Large Area Metallic Nano-Split-Ring Arrays by Nanoimprint Lithography

Strong field enhancement and ultra-narrow linewidth based on the coupling of anapole/gap modes in silicon nanodimer-ring arrays

Fabrication of Centimeter-Scale Plasmonic Nanoparticle Arrays with Ultranarrow Surface Lattice Resonances.

Printable Nanoscopic Metamaterial Absorbers and Images with Diffraction-Limited Resolution

Large-Area Fabrication of Complex Nanohole Arrays with Highly Tunable Plasmonic Properties.

Tunable and scalable fabrication of plasmonic dimer arrays with sub-10 nm nanogaps by area-selective atomic layer deposition

Au nanoring arrays with tunable morphological features and plasmonic resonances

Large-area zinc oxide nanorod arrays templated by nanoimprint lithography: control of morphologies and optical properties

High-Throughput Fabrication of Ultradense Annular Nanogap Arrays for Plasmon-Enhanced Spectroscopy

Wet‐chemical synthesis of two‐dimensional complex nanorings for near‐field focusing