Abstract:An innovative printing platform for additive manufacturing of metamaterials using wetting contrast is introduced. By combining imprinting lithography with transfer printing, precise control over local wettability is achieved. This method enables us to pattern various functional materials and finely adjust vertical structures, including pattern thickness and hetero‐multilayer formations. Additionally, the platform produces foldable, disposable metamaterials on ultra‐thin sheets. The widespread utilization of metamaterials, despite their immense transformative potential, faces challenges regarding scalability in mass production. To address these limitations, an additive method that leverages liquid inks and selective wetting to produce scalable and cost‐effective metamaterials is presented. UV‐based imprinting lithography is utilized to fabricate surface energy‐modulated patterns, enabling precise solution patterning. This approach, unlike conventional UV‐based imprinting lithography, not only accurately produces the negative replica of the stamp topography during UV‐induced crosslinking but also transfers a hydrophobic layer onto the raised surfaces of the imprinted hydrophilic layer, resulting in 3D shapes with spatially modulated surface energy. In the second process step, a functional ink is dragged over the patterned substrate where it dewets to fill the hydrophilic recesses. This innovative process enables high‐speed metamaterial production, with ink deposition speeds up to 12 m min−1. The method accommodates a wide range of inks, including metals, dielectrics, and semiconductors, providing meticulous control over vertical structures such as pattern thickness and hetero‐multilayer formation. Additionally, it offers flexibility in creating metamaterials on free‐standing ultra‐thin sheets, introducing desirable attributes like foldability and disposability. The effectiveness of this approach is validated through the fabrication and characterization of metallic metamaterials.

Printable Nanoscopic Metamaterial Absorbers and Images with Diffraction-Limited Resolution

Single-color Peripheral Photoinhibition Lithography of Nanophotonic Structures

Omnidirectional, Thin Metasurface Exhibiting Selective Absorption for Un-Polarized Broadband Incidence

High-resolution 3D Nanoprinting Based on Two-Step Absorption Via an Integrated Fiber-Coupled Laser Diode.

3D nanoprinting for fiber-integrated achromatic diffractive lens

Multifunctional Metasurface: Coplanar Embedded Design for Metalens and Nanoprinted Display

Diatom Cribellum‐inspired Hierarchical Metamaterials: Unifying Perfect Absorption Towards Subwavelength Color Printing

Optical nano-woodpiles: large-area metallic photonic crystals and metamaterials

Large-Scale and Wide-Gamut Coloration at the Diffraction Limit in Flexible, Self-Assembled Hierarchical Nanomaterials

Large-area, Lithography-Free Super Absorbers and Color Filters at Visible Frequencies Using Ultrathin Metallic Films

Large-scale Lithography-Free Metasurface with Spectrally Tunable Super Absorption

Sub-diffraction-limited Interference Photolithography with Metamaterials

Wafer-scale nanofabrication of sub-5 nm gaps in plasmonic metasurfaces

Roll‐to‐Roll Compatible Topochemical Wetting Control for Metamaterial Printing

Dielectric metalens by multilayer nanoimprint lithography and solution phase epitaxy

Tunable and scalable fabrication of plasmonic dimer arrays with sub-10 nm nanogaps by area-selective atomic layer deposition

Subwavelength Resolution Using Metamaterials With Different Dispersion Relations

Metamaterials: from 3D Plasmonic Nanostructure to Reflective Metasurface

Metalenses at visible wavelengths: Diffraction-limited focusing and subwavelength resolution imaging

Full-Spectrum Flexible Color Printing at the Diffraction Limit

Interference Photolithography with Metamaterials