A Comparative Study of CCl4reactions on Ag and Si Surfaces Byin Situultraviolet Photoemission Electron Microscopy

Yunxi Yao,Qiang Fu,Dali Tan,Xinhe Bao
DOI: https://doi.org/10.1088/0953-8984/21/31/314014
2009-01-01
Journal of Physics Condensed Matter
Abstract:The reactivity of a bulk Ag surface, an Ag monolayer film on Si(111)- 7 × 7 (denoted as the [Formula: see text]-Ag-Si surface), and Si(111)-7 × 7 to CCl(4) was investigated by x-ray photoelectron spectroscopy (XPS) and ultraviolet photoemission electron microscopy (UV-PEEM). In situ UV-PEEM was used to monitor simultaneously the CCl(4) dissociation on different surface domains, including the bulk Ag, [Formula: see text]-Ag-Si, and Si(111). The PEEM results combined with XPS data show that CCl(4) adsorbs dissociatively on bulk Ag(111) and Si(111) but adsorbs molecularly on the [Formula: see text]-Ag-Si surface, and the surface reactivity follows the order of [Formula: see text]-Ag-Si.
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