Sharp Transformation across Morphotropic Phase Boundary in Sub‐6 nm Wake‐Up‐Free Ferroelectric Films by Atomic Layer Technology

Chun‐Ho Chuang,Ting‐Yun Wang,Chun‐Yi Chou,Sheng‐Han Yi,Yu‐Sen Jiang,Jing‐Jong Shyue,Miin‐Jang Chen
DOI: https://doi.org/10.1002/advs.202302770
IF: 15.1
2023-09-28
Advanced Science
Abstract:Significant ferroelectricity in sub‐6 nm thin films is boosted by atomic layer engineering on the HfO2 seeding layer, triggering the morphotropic phase boundary effect correlated with the dramatic transition from antiferroelectric to ferroelectric phase in ZrO2. Furthermore, clear images of surface grains taken by helium ion microscopy are employed to characterize the transformation of crystallographic structures for the first time. Atomic layer engineering is investigated to tailor the morphotropic phase boundary (MPB) between antiferroelectric, ferroelectric, and paraelectric phases. By increasing the HfO2 seeding layer with only 2 monolayers, the overlying ZrO2 layer experiences the dramatic phase transition across the MPB. Conspicuous ferroelectric properties including record‐high remanent polarization (2Pr ≈ 60 μC cm−2), wake‐up‐free operation, and high compatibility with advanced semiconductor technology nodes, are achieved in the sub‐6 nm thin film. The prominent antiferroelectric to ferroelectric phase transformation is ascribed to the in‐plane tensile stress introduced into ZrO2 by the HfO2 seeding layer. Based on the high‐resolution and high‐contrast images of surface grains extracted precisely by helium ion microscopy, the evolution of the MPB between tetragonal, orthorhombic, and monoclinic phases with grain size is demonstrated for the first time. The result indicates that a decrease in the average grain size drives the crystallization from the tetragonal to polar orthorhombic phases.
materials science, multidisciplinary,nanoscience & nanotechnology,chemistry
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