A Detailed Study of the Forming Stage of an Electrochemical Resistive Switching Memory by Kmc Simulation

Feng Pan,Shong Yin,Vivek Subramanian
DOI: https://doi.org/10.1109/led.2011.2143691
IF: 4.8157
2011-01-01
IEEE Electron Device Letters
Abstract:The forming stage characteristics of electrochemical-metallization resistive-switching-random-access-memory cells are studied with an improved kinetic Monte Carlo simulator. The filament topographies obtained at different forming voltage levels and the relationship between forming time and filament topographies are investigated in detail. The so-called "voltage-time dilemma" is simulated and studied. In addition, the various chemical and physical processes that produce these results are discussed. Finally, the simulated pattern is compared with experiments conducted on Cu/H2O and Ag/Ag2S systems.
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