Vertically Aligned Growth of ZnO Nanonails by Nanoparticle-Assisted Pulsed-Laser Ablation Deposition

R.Q. Guo,J. Nishimura,M. Ueda,M. Higashihata,D. Nakamura,T. Okada
DOI: https://doi.org/10.1007/s00339-007-4174-7
2007-01-01
Abstract:Vertically aligned ZnO nanonails have been successfully grown on annealed sapphire substrates at comparatively high gas pressure using catalyst-free nanoparticle-assisted pulsed-laser ablation deposition (NAPLD). The growth behavior of the ZnO nanonails has been investigated by variation of the ablation time, which we name ‘isolated particle initiated growth’ and a three-step growth mechanism for ZnO nanonails is proposed. SEM analysis reveals that each of the uniquely shaped ZnO nanonails consists of a so-called hexagonal rod-shaped ‘root’ and a slightly tapered ‘stem’. The well-aligned ZnO nanonails exhibit a strong ultraviolet (UV) emission at around 390 nm under room temperature and only negligible visible emission, which indicates that there is a very low concentration of oxygen vacancies in the highly oriented ZnO nanonails. The as-synthesized nanonail arrays on sapphire substrate could offer novel opportunities for both fundamental research and technological applications.
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