High Frequency Characteristics Of Fecoalo Thin Films Combined The Effects Of Stress And Magnetic Field

Fu Zheng,Xuan Wang,Xu Li,Jianmin Bai,Dan Wei,Xiaoxi Liu,Wenhui Xie,Fulin Wei

DOI: https://doi.org/10.1063/1.3551593

IF: 2.877

2011-01-01

Journal of Applied Physics

Abstract:The soft magnetic FeCoAlO thin films with different response at high frequency were prepared by using RF magnetron sputtering. Two different configurations of the sputtering targets were used: the Al(2)O(3) chips were placed on Fe(70)Co(30) disk either uniformly dispersed on the sputtering area (Target-A) or dispersed on the half side of the sputtering area (Target-B). It was found that, although, the films deposited from both of Target A and B possessed good soft magnetic properties and in-plane uniaxial magnetic anisotropy, they showed different behaviors at high frequency. The films deposited by using Target-A have mean permeability of 500 and a cut-off frequency (f(r)) of around 780 MHz, while the films deposited by using Target-B have mean permeability of 200 and a f(r) of 3.4 GHz. The higher f(r) of the later corresponds to the higher uniaxial anisotropic field in the films deposited by using the Target-B, which due to an extra anisotropy induced by the stress resulted from gradient of the Al-O composition. By adjusting the configuration of Target-B, the permeability & f(r) can be tuned to satisfy the different requirements for certain industrial applications. (C) 2011 American Institute of Physics. [doi:10.1063/1.3551593]