Optical and Electrochemical Properties of Cu-doped NiO Films Prepared by Electrochemical Deposition

Lili Zhao,Ge Su,Wei Liu,Lixin Cao,Jing Wang,Zheng Dong,Meiqin Song
DOI: https://doi.org/10.1016/j.apsusc.2010.11.160
IF: 6.7
2011-01-01
Applied Surface Science
Abstract:Cu-doped nickel oxide (NiO) thin films were prepared by electrochemial deposition (cathodic deposition) technique onto the fluorine doped tin oxide (F: SnO2; FTO) coated glass substrates from organic solutions. Effects of Cu content on the morphology, structure, optical and electrochromic properties of NiO films were investigated by means of scanning electron microscope (SEM), X-ray diffraction (XRD), ultraviolet–visible spectrophotometer (UV–vis) and cyclic voltammetry (CV), respectively. SEM images indicated the formation of nanorods after Cu was added. The films were formed with amorphous or short-range ordered NiO grains and a trace of face-centered cubic NixCu1−xO confirmed by XRD. The transmittances of both bleached state and colored state were significantly lowered when Cu was added. The NiO films doped with Cu (the molar ratio was 1/8) exhibited the optimum electrochromic behavior with a variation of transmittance (ΔT) up to ∼80% at the wavelength range of 350–600nm. Cu doping reduces the response time for both the coloring and bleaching states, and the reversibility of the redox reaction was increased as well.
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