Influences of Ni–5 at.%W Alloy Substrates on the Epitaxial Growth and Surface Morphologies of CeO 2 Films Deposited by PLD

Shengping Zhu,Linfei Liu,Da Xu,Huaran Liu,Xiaokun Song,Dan Hong,Wang Ying,Yijie Li
DOI: https://doi.org/10.1007/s10948-011-1136-2
2011-01-01
Journal of Superconductivity and Novel Magnetism
Abstract:We fabricated CeO 2 films using pulsed laser deposition (PLD) for YBa 2 Cu 3 O 7− δ coated conductors on Ni–5 at.%W alloy substrates and investigated the effect of Ni–5 at.%W tapes on the epitaxial growth and surface morphologies of CeO 2 deposited on various substrates at various temperatures ranging from 650 to 770 °C. The texture and microstructure of substrates and CeO 2 films were measured by X-ray diffraction (XRD), optical microscope (OM), field emission scanning electron microscope (FESEM) and atomic force microscopy (AFM). It was found that the texture and microstructure of Ni–5 at.%W substrates, such as Ni(111), grain size, the depth of grain boundary grooves and surface roughness, affected the growth of CeO 2 films. Especially, the depth of grain boundary grooves of substrates resulted in high intensity of CeO 2 (111) peak and high surface roughness of CeO 2 films. We also found that high growth temperature effectively reduced the influence of substrate surface roughness on the epitaxial growth of CeO 2 films. CeO 2 films with high in-plane and out-of-plane alignments (Δ φ =5.54°, Δ ω =3.40°) were obtained under optimum condition.
What problem does this paper attempt to address?