Abstract:The fabrication of large-area and flexible nanostructures currently presents various challenges related to the special requirements for 3D multilayer nanostructures, ultrasmall nanogaps, and size-controlled nanomeshes. To overcome these rigorous challenges, a simple method for fabricating wafer-scale, ultrasmall nanogaps on a flexible substrate using a temperature above the glass transition temperature (<i>T</i>g) of the substrate and by layer-by-layer nanoimprinting is proposed here. The size of the nanogaps can be easily controlled by adjusting the pressure, heating time, and heating temperature. In addition, 3D multilayer nanostructures and nanocomposites with 2, 3, 5, 7, and 20 layers were fabricated using this method. The fabricated nanogaps with sizes ranging from approximately 1 to 40 nm were observed via high-resolution transmission electron microscopy (HRTEM). The multilayered nanostructures were evaluated using focused ion beam (FIB) technology. Compared with conventional methods, our method could not only easily control the size of the nanogaps on the flexible large-area substrate but could also achieve fast, simple, and cost-effective fabrication of 3D multilayer nanostructures and nanocomposites without any post-treatment. Moreover, a transparent electrode and nanoheater were fabricated and evaluated. Finally, surface-enhanced Raman scattering substrates with different nanogaps were evaluated using rhodamine 6G. In conclusion, it is believed that the proposed method can solve the problems related to the high requirements of nanofabrication and can be applied in the detection of small molecules and for manufacturing flexible electronics and soft actuators.

Controllable Formation of Nanogaps in Thin Metallic Film by Rear Side Irradiation with Ultrashort Pulsed Laser

Large-Area Nanogap-Controlled 3D Nanoarchitectures Fabricated via Layer-by-Layer Nanoimprint

In-situ control of on-chip angstrom gaps, atomic switches, and molecular junctions by light irradiation

Large Area Uniform Nanostructures Fabricated by Direct Femtosecond Laser Ablation

Nano-Patterning by Pulsed Laser Irradiation in Near Field

Ultrafast Laser-Induced Premelting and Structural Transformation of Gold Nanorod

Fabrication of Sub-10 Nm Gap by Using Electron Beam Lithography

Controllable fabrication of Sub-20nm structures with coupling field tip enhancement effect induced by nanosecond pulsed laser irradiation

Fabrication of highly homogeneous and controllable nanogratings on silicon via chemical etching-assisted femtosecond laser modification

Fabrication of Nanostructures by Laser Optical Focusing

Lithography-Independent and Large Scale Fabrication of A Metal Electrode Nanogap

Surface Nano-fabrication by Laser Precision Engineering

Near-Field-Regulated Ultrafast Laser Supra-Wavelength Structuring Directly on Ultrahard Metallic Glasses

The Novel Nanosecond Laser Micro-Manufacturing of Three-Dimensional Metallic Structures

Single-step maskless nano-lithography on glass by femtosecond laser processing

Tailored engineering of crystalline surface enabled by ion-irradiation-assisted femtosecond laser ablation

Laser patterning of conductive gold micronanostructures from nanodots.

Generation mechanisms of laser-induced periodic nanostructures on surfaces of microgrooves

Micro-and nano-structures on metal induced by femtosecond laser radiation

Generation and Formation of Gold Nanoparticles with Spatial Control by Two-Photon Femtosecond Laser Interference

Large-area one-step assembly of three-dimensional porous metal micro/nanocages by ethanol-assisted femtosecond laser irradiation for enhanced antireflection and hydrophobicity.