Atomistic structure and energetics of interface between Mn-doped γ-Ga 2 O 3 and MgAl 2 O 4

Hiroyuki Hayashi,Rong Huang,Fumiyasu Oba,Tsukasa Hirayama,Isao Tanaka
DOI: https://doi.org/10.1007/s10853-011-5313-2
IF: 4.5
2011-01-01
Journal of Materials Science
Abstract:The interface between an Mn-doped γ-gallium oxide (Ga 2 O 3 ) thin film and an MgAl 2 O 4 (001) substrate has been investigated using high-resolution transmission electron microscopy (HRTEM), high-angle annular dark-field scanning transmission electron microscopy (HAADF-STEM), and first-principles calculations. A high-quality Mn-doped γ-Ga 2 O 3 film with a defective spinel structure has been epitaxially grown by pulsed laser deposition. The γ-Ga 2 O 3 crystal shows an uniform tetragonal distortion with a tetragonality of 1.05 throughout the film thickness of 75 nm. HRTEM and HAADF-STEM observations reveal that the γ-Ga 2 O 3 and MgAl 2 O 4 crystals form a coherent interface without any interfacial layers or precipitates. The atomistic structure and energies are theoretically evaluated for the interfaces with two types of termination plane, i.e., Mg- and Al 2 O 4 -termination of MgAl 2 O 4 . The cation sublattice is found to be continuous for both interfaces despite the defective spinel structure of Mn-doped γ-Ga 2 O 3 with some vacant cation sites. The Al 2 O 4 -termination shows a lower interfacial energy than the Mg-termination under most conditions of the chemical potentials. This behavior is attributed to the energetic preference of the Mn–Al 2 O 4 local configuration at the interface.
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