Effect of plasma cleaning process on the surface morphology and adhesion strength of Mg alloy substrate

Ge LIANG,Hong-tao LI,Bai-ling JIANG,Wen-wen WU,Hong-jun ZHANG,Ping YANG
2011-01-01
Abstract:Mg alloy substrate samples were cleaned at different plasma cleaning process and pure Cr coatings were deposited using magnetron sputtering technique. Surface micrographs of Mg alloy substrate and adhesion strength of the coatings were analyzed by SEM and scratch tester. The results show that: the substrate surface is shown the deep-hole diameter is greater than 0.5-like structural defects owing to excessive cleaning voltage. After long time cleaning the energy accumulation effect generated the temperature increase significantly by the ion bombardment of the substrate surface and the local region shown the melting, sintering phenomenon. Both of them made the adhesion strength of following accumulated coatings decreased.
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