Enhanced thermopower of graphene films with oxygen plasma treatment.

Ni Xiao,Xiaochen Dong,Li Song,Dayong Liu,YeeYan Tay,Shixin Wu,Lain-Jong Li,Yang Zhao,Ting Yu,Hua Zhang,Wei Huang,Huey Hoon Hng,Pulickel M Ajayan,Qingyu Yan
DOI: https://doi.org/10.1021/nn2001849
IF: 17.1
2011-01-01
ACS Nano
Abstract:In this work, we show that the maximum thermopower of few layers graphene (FLG) films could be greatly enhanced up to ∼700 μV/K after oxygen plasma treatment. The electrical conductivities of these plasma treated FLG films remain high, for example, ∼10(4) S/m, which results in power factors as high as ∼4.5 × 10(-3) W K(-2) m(-1). In comparison, the pristine FLG films show a maximum thermopower of ∼80 μV/K with an electrical conductivity of ∼5 × 10(4) S/m. The proposed mechanism is due to generation of local disordered carbon that opens the band gap. Measured thermopowers of single-layer graphene (SLG) films and reduced graphene oxide (rGO) films were in the range of -40 to 50 and -10 to 20 μV/K, respectively. However, such oxygen plasma treatment is not suitable for SLG and rGO films. The SLG films were easily destroyed during the treatment while the electrical conductivity of rGO films is too low.
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