Full-Field Thickness Measuring of Photoresist on Spherical Surface in Lithography Techniques

Jingyu Liang,Yiyong Liang
DOI: https://doi.org/10.1109/sopo.2011.5780647
2011-01-01
Abstract:In this paper, we introduce a method for measuring the thickness of photoresist on the surface of full-field spherical substate. This method is implemented by measuring the reflection power of incident light. Compared with other metrology, our method has many features such as real-time and compact optical setup.
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