Abstract:Mechanical scratching and chemical self-assembling can be combined to fabricate nano- or micro-scale functional structures on the oxide-coated silicon. The chemo-active species, such as NO2C6H4 groups, can be produce from aryldiazonium salt due to the breaking of chemical bond of silicon substrate when the diamond tool scratches the silicon sample in the presence of 4-benzoic nitryl diazonium tetrafluoroborate (NO2C6H4N2BF4). They may then induce grafting of an organic monolayer on the substrate via Si-C connection. The surface morphologies before and after chemomechanical reaction are characterized with Atomic Force Microscopy (AFM). We propose that chemomechanical reaction, which occurred during scratching the silicon surface, produce NO2C6H4 groups from aryldiazonium salt. The NO2C6H4 groups further bond with surface Si atoms via Si-C covalent bonds as confirmed from Infrared Spectroscopy (IR) results. To better understand the framework of the self-assembly monolayers (SAMs) on Si (100) surface, the first principles calculation at density functional theory levels has been employed to investigate the binding energy, bonds length and bonds angle. The reduced energy of system illuminates that the SAMs can be fabricated easily between aryldiazonium salt and Si (100) surface. The stability of system can be improved and SAMs can firmly stay on Si (100) surface.

Preparation of Aryldiazonium Salt Monolayers on Si(100) Surface by Chemomechanical Method

Preparation of Self-Assembly Monolayer by Scratching Si(100) Surface in the Presence of Aryl Diazonium Salts

Fabrication of Functional Structures at Si (100) Surface by Mechanical Scribing in the Presence of Aryl Diazonium Salts

Chemomechanical Production of Functional Structure on Silicon Surfaces

Preparation and Tribological Behaviors of an Amide-Containing Stratified Self-Assembled Monolayers on Silicon Surface

Controlled Monolayer Self-Assembly Process Based on the Atomic Force Microscopy Nanoscratching Method

First-Principles Study of the Self-Assembly Mono Layer on Silicon (100) Surface

Manipulation of Structure on Silicon Surfaces Via Chemical Adsorption

Electrochemically driven organic monolayer formation on silicon surfaces using alkylammonium and alkylphosphonium reagents

Self-assembly of amino-functionalized monolayers on silicon surfaces and preparation of superhydrophobic surfaces based on alkanoic acid dual layers and surface roughening.

Selective Functionalization of Silicon Surface Controlled by Metastable Helium Atom Beam for Patterning Chemisorbed Monolayer Molecular Assemblies

Preparation and Characterization of 1-Hexadecene Thin Film on Silicon Surface

Preparation of Hydrophobic/Superhydrophobic Surface on Silicon Wafer by Reactive Ion Etching and Self-assembled Monolayers

Fabrication of Surfaces with Nanoislands of Chemical Functionality by the Phase Separation of Self-Assembling Monolayers on Silicon

Preparation And Micro-Tribological Property Of Hydrophilic Self-Assembled Monolayer On Single Crystal Silicon Surface

Fabrication and tribological properties of self-assembled monolayer of n-alkyltrimethoxysilane on silicon: Effect of SAM alkyl chain length

Self-assembling of Cyano- and Carboxyl-Terminated Monolayers Using Short-Chain Alkylsiloxane

Growth and Properties of Self-Assembled Monolayers on Metals

Self-assembled Monolayer of Designed and Synthesized Triazinedithiolsilane Molecule As Interfacial Adhesion Enhancer for Integrated Circuit.

Building Organic Monolayers Based on Fluorinated Amines on the Si(111) Surface

Monolayer Formation on Silicon and Mica Surfaces Rearranged from N-Hexadecanoyl-l-alanine Supramolecular Structures.