Abstract:The gas-phase decomposition kinetics and thermochemistry of 1,1,1,3,3,3-hexamethyldisilazane (HMDSZ) and 1,1,3,3-tetramethyldisilazane (TMDSZ), two potential single-source precursors for the chemical vapor deposition of silicon carbonitride thin films, were systematically investigated using ab initio calculations at the B3LYP/6-311++G(d,p)//CCSD(T)/6-311++G(d,p) level of theory. Both concerted and stepwise decomposition routes for each molecule were examined, allowing for a comparison of the reactions involving the cleavages of common bonds of Si-C, Si-N, and N-H for the two molecules. A new set of reaction pathways open to TMDSZ due to the presence of a Si-H bond was also explored. It was found that all three bonds of Si-N, Si-C, and N-H could be broken more easily in TMDSZ than HMDSZ. Both HMDSZ and TMDSZ are capable of producing silene and silanimine species upon decomposition. In fact, the most kinetically and thermodynamically favorable pathways fall in the formation of these species. The concerted formation of 1-dimethylsilylaminosilene via the elimination of methane from TMDSZ is the most kinetically and thermodynamically favorable route between the two molecules with an activation barrier (ΔH0⧧) of 48.5 kcal mol-1 and reaction enthalpy (ΔH0) of 11.6 kcal mol-1, respectively. These values are lower than the corresponding lowest values in HMDSZ of ΔH0⧧ = 66.4 kcal mol-1 for the concerted production of 1,1-dimethylsilene and trimethylsilylamine and ΔH0 = 41.7 kcal mol-1 for the formation of CH4 and N-trimethylsilyl-1,1-dimethylsilanimine. Overall, this work has provided insights into the reactivity of the two molecules. It has been shown that TMDSZ is more reactive than its analog HMDSZ due to the presence of the Si-H bonds and reduced steric hindrance.

Thermodynamic Research on Synthesis of Dichloromethylphenylsilane by Condensation Method

Synthesis of Phenylchlorosilane by Gas Phase Condensation Method

Mechanism and Kinetics of the Synthesis of Phenyltrichlorosilane from Trichlorosilane and Chlorobenzene by Gas Phase Condensation

Synthesis of Methylphenyldichlorosilane with a Homogeneous Catalyst

Study on Synthesis of 4,4'-Bis(dimethoxyphosphonomethyl)-diphenyl

Detailed Kinetics of Methylphenyldichlorosilane Synthesis from Methyldichlorosilane and Chlorobenzene by Gas Phase Condensation

CONVERSION AND UTILIZATION OF BYPRODUCTS IN DIRECT SYNTHESIS OF METHYLCHLOROSILANES

Conversion of Methyltrichlorosilane in Stirred Bed Reactor by Methylalumminumchloride Method

Effect of Chloralkanes on the Phenyltrichlorosilane Synthesis by Gas Phase Condensation

Preparation of dimethyldichlorosilane by redistributing methyltrichlorosilane and trimethylchlorosilane with AlCl3 supported catalysts

Synthesis of Diethoxy(methyl)vinylsilane via Hydrosilylation Reaction

STUDY ON REACTION OF DICHLORODIMETHYLSILANE AND DIMETHYLCYCLOPOLYSILOXANE WITH ~1H NMR

Chlorination of trichlorosilane/chlorodimethylsilane using metal chlorides: experimental and mechanistic investigations

Process characteristics of Cu-based catalyst in direct synthesis of methylchlorosilanes

Theoretical Study on the Decomposition Kinetics and Thermochemistry of Tetramethyldisilazane and Hexamethyldisilazane─Formation of Silanimine and Silene Species

Mechanistic Investigation of Zinc-Promoted Silylation of Phenylacetylene and Chlorosilane: a Combined Experimental and Computational Study.

The Preparation Technology of Methylphenyleyclosiloxane

Synthesis of Diphenylmethane from Benzene and Paraformaldehyde Catalyzed by Acidic Ionic Liquids

Thermodynamic Analysis of Manufacturing Polysilicon from SiHCl3, SiCl4 and H2

Gas-phase kinetics of chlorosilylene reactions. I. ClSiH + Me3SiH: absolute rate measurements and theoretical calculations for prototype Si-H insertion reactions

Gas-phase kinetics of chlorosilylene reactions II. ClSiH + C2H4: absolute rate measurements and quantum chemical and RRKM calculations for the prototype pi addition reaction