Improved Photoelectrochemical Responses of Si and Ti Codoped Α-Fe2o3 Photoanode Films

Minglong Zhang,Wenjun Luo,Zhaosheng Li,Tao Yu,Zhigang Zou
DOI: https://doi.org/10.1063/1.3470109
IF: 4
2010-01-01
Applied Physics Letters
Abstract:We studied photoelectrochemical performance of the undoped, Si-doped, Ti-doped, and codoped alpha-Fe2O3 film prepared by ultrasonic spray pyrolysis. Since the ions radius of Si4+<Fe3+<Ti4+, Si and Ti codoping can balance the ion radius difference between Fe3+ and Si4+ (or Ti4+) and increase the donor concentration. Their donor concentrations, calculated from slopes of the Mott-Schottky plots, are 9.10 x 10(18) cm(-3), 1.89 x 10(20) cm(-3), 2.04 x 10(20) cm(-3), and 7.06 x 10(20) cm(-3), respectively. Incident photon to current efficiency of the codoped film is 34% at 365 nm and 0.6 V versus Ag/AgCl, much higher than 10%, 20%, and 22% for the undoped, Si-doped, and Ti-doped film, respectively. (C) 2010 American Institute of Physics. [doi:10.1063/1.3470109]
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