Direct Demonstration of Sensitization at 980nm Optical Excitation in Erbium-Ytterbium Silicates

Michiel Vanhoutte,Bing Wang,Zhiping Zhou,Juergen Michel,Lionel C. Kimerling
DOI: https://doi.org/10.1109/group4.2010.5643345
2010-01-01
Abstract:Sensitization of erbium by ytterbium in ErxYb2-xSiO5 thin films at 980nm optical excitation is demonstrated by means of comparison of the 1.54μm photoluminescence intensities excited with 488nm and 980nm light. Additionally, it is shown that detrimental Er-Er interactions such as concentration quenching increase non-radiative decay rates at high erbium concentrations. Dilution of erbium by ytterbium reduces these interactions, leading to an increase of internal quantum efficiency.
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