Development of X-ray Microscopy at IPOE
J. Zhu,B. Mu,Q. Huang,C. Huang,S. Yi,Z. Zhang,F. Wang,Z. Wang,L. Chen
DOI: https://doi.org/10.1063/1.3625340
2011-01-01
AIP Conference Proceedings
Abstract:In order to meet the different requirements of applications in synchrotron radiation and plasma diagnosis in China, focusing and imaging optics based on Kirkpatrick-Baez (KB) mirrors, compound refractive lenses (CRLs), and multilayer Laue lenses (MLLs) were studied in our lab. A one-dimensional KB microscope using mirrors with a dual-periodic multilayer coating was developed. The multilayer mirror can reflect both 4.75 keV (Ti K-line) and 8.05 keV (Cu K-line) simultaneously, which makes alignment easier. For hard x-ray microscopy, CRL was studied. Using a SU-8 resist planar parabolic CRL, a focal line of 28.8-mu m width was obtained. To focus hard x-rays to nanometer levels efficiently, an MLL was fabricated using a WSi(2)/Si multilayer. The MLL consists of 324 alternating WSi(2) and Si layers with a total thickness of 7.9 mu m. (Recently, a much thicker multilayer has been deposited with a layer number of n = 1582 and a total thickness of 27 mu m.) After deposition, the sample was sliced and polished into an approximate ideal aspect ratio (depth of the zone plate to outmost layer thickness); the measured results show an intact structure remains, and the surface roughness of the cross section is about 0.4 nm after grinding and polishing processes.