Tuning the Termination of the Srtio3(110) Surface by Ar+ Sputtering

Zhiming Wang,Kehui Wu,Qinlin Guo,Jiandong Guo
DOI: https://doi.org/10.1063/1.3180701
IF: 4
2009-01-01
Applied Physics Letters
Abstract:We report a scanning tunneling microscopy study on the SrTiO3(110) surface treated with Ar+ sputtering followed by annealing. Two types of termination coexist on the surface, which are spatially identified as the 4×1 reconstructed SrTiO layer and the O layer covered by Ti-rich oxide clusters, respectively. The relative areal ratio of the two types is tuned by sputtering dose reproducibly, and monophased surface with either SrTiO or O termination is obtained. The surface is stable at temperatures up to 1100 °C and under oxygen partial pressures from 6×10−5 mbar to ultra high vacuum, providing us a flexible epitaxial growth template.
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