In situ study on depth-resolved chemical states of undoped SrTiO3(001) surface during Ar+ sputtering and annealing process with XPS

Dongwoo Kim,Hojoon Lim,Minsik Seo,Hyunsuk Shin,Kyungmin Kim,Subin Jang,Ki-jeong Kim,Jeongjin (John) John Kim,Bongjin S Mun
DOI: https://doi.org/10.1039/d4tc01262c
IF: 6.4
2024-05-31
Journal of Materials Chemistry C
Abstract:With the synchrotron-based depth-resolved XPS measurements, the modification of surface chemical states and the behavior of various impurities on undoped SrTiO 3 (001) surfaces are investigated. During Ar + sputtering process, both the oxygen vacancies in TiO 2 layer and the formation of SrO layer are found. When the UHV annealing process initiates, the oxygen vacancies in TiO 2 layer starts to decrease, indicating a sign of oxygen migration from the bulk to the surface region. At the annealing step at 873 K, the concentration of the oxygen vacancies starts to increase due to the lattice oxygen loss to UHV atmosphere. Throughout the surface preparation process, the sample impurities always exist on the surface with a small variation in their chemical states. The variation of chemical states of SrTiO 3 and its impurities suggests a sign of the oxygen exchange during the sample preparation process. Our results provide the valuable insights on how the elements of SrTiO 3 behaves during the surface preparation procedures and interact with surface impurities.
materials science, multidisciplinary,physics, applied
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