Smart Design of Resistive Switching Memory by an In Situ Current‐Induced Oxidization Process on a Single Crystalline Metallic Nanowire
Yu‐Chuan Shih,Ling Lee,Kai‐De Liang,Arumugam Manikandan,Wen‐Wu Liu,Yu‐Ze Chen,Mu‐Tung Chang,Zhiming M. Wang,Yu‐Lun Chueh
DOI: https://doi.org/10.1002/aelm.202000252
IF: 6.2
2021-02-11
Advanced Electronic Materials
Abstract:<p>Resistive switching random access memory (ReRAM) has recently generated significant interest due to its potentials used in nanoscale logic, memory devices, and neuromorphic applications. From the device physics, a uniform dielectric layer is necessary to access as the main switching layer to perform stable resistive switching. This, however, makes the fabrication process more challenging. In this regard, a design of resistive switching memory by an in situ current‐induced oxidization process on a single crystal metallic nanowire (NW) is demonstrated where a single crystal Cu NW is found as the best material with stable switching behaviors after the in situ current‐induced oxidization process. With the in situ current‐induced oxidization process by high current density on the Cu NW, a reversible resistive switching up to 100 cycles with a large ON/OFF ratio of >10<sup>3</sup> and a low switching voltage of <0.5 V can be obtained. The initial current‐induced oxidation provides a core–shell (Cu<sub>2</sub>O/Cu) nanowire structure that contributed to the switching properties. The possible switching mechanisms and potential guidelines are systematically proposed. The current work opens up the opportunities to design the ReRAM device with full‐ metallic materials.</p>
materials science, multidisciplinary,physics, applied,nanoscience & nanotechnology