Wetting layer evolution and its temperature dependence during self assembly of InAs/GaAs quantum dots
Hongyi Zhang,Yonghai Chen,Guanyu Zhou,Chenguang Tang,Zhanguo Wang
DOI: https://doi.org/10.1186/1556-276X-7-600
2012-05-02
Abstract:For InAs/GaAs(001) quantum dot (QD) system, the wetting layer (WL) evolution and its temperature dependence were studied using reflectance difference spectroscopy (RDS) and analyzed with a rate equation model. The WL thicknesses showed a monotonic increase at relatively low growth temperatures but a first increase and then decrease at higher temperatures, which were unexpected from the thermodynamic understanding. By adopting a rate equation model, the temperature dependence of QD growth was assigned as the origin of different WL evolutions. A brief discussion on the indium desorption was also given. Those results gave hints of the kinetic aspects of QD self-assembly.
Mesoscale and Nanoscale Physics