Effect of Surface Roughness on the Magnetism, Nano-indentation, Surface Energy, and Electrical Properties of Co60Fe20Dy20 Films on Si (100) Substrate
Wen-Jen Liu,Yung-Huang Chang,Chia-Chin Chiang,Yuan-Tsung Chen,Chih-Chien Lin,Pei-Ling Chen,Shih-Hung Lin
DOI: https://doi.org/10.1007/s11664-023-10904-x
IF: 2.1
2024-03-03
Journal of Electronic Materials
Abstract:In this study, we focused on depositing a target material, cobalt-iron-dysprosium (Co 60 Fe 20 Dy 20 ), onto silicon (Si) (100) substrates with thickness varying from 10 nm to 50 nm through a direct-current (DC) magnetron sputtering technique. The subsequent step involved subjecting the samples to an hour-long annealing process in a vacuum annealing furnace at temperatures of 100°C, 200°C, and 300°C. To assess the elemental composition of the CoFeDy films, energy-dispersive X-ray spectroscopy (EDS) was employed. An observed trend indicated an increase in low-frequency alternating-current magnetic susceptibility ( χ ac ) with the increasing thickness. Remarkably, the CoFeDy films exhibited their peak χ ac following annealing at 300°C, with an optimal resonance frequency of 50 Hz. After annealing at 300°C, the CoFeDy film's surface energy peaked at 50 nm. The magnetic, electrical, and adhesive properties of the CoFeDy films were notably influenced by surface roughness at different annealing temperatures. Atomic force microscopy (AFM) analysis revealed a gradual reduction in film roughness post-annealing, corresponding to smoother surfaces indicative of a weaker domain wall pinning effect, heightened carrier conductivity, and increased liquid spreading. Collectively, these outcomes contributed to diminished χ ac , reduced electrical resistance, and enhanced adhesion.
engineering, electrical & electronic,materials science, multidisciplinary,physics, applied