Resistive Switching Memory Effect of ZrO2 Films with Zr+ Implanted

Qi Liu,Weihua Guan,Shibing Long,Rui Jia,Ming Liu,Junning Chen
DOI: https://doi.org/10.1063/1.2832660
IF: 4
2008-01-01
Applied Physics Letters
Abstract:The Au/Cr/Zr+-implanted-ZrO2/n(+)-Si sandwiched structure exhibits reversible bipolar resistive switching behavior under dc sweeping voltage. The resistance ratio (R-ratio) of high resistive state and low resistive state is as large as five orders of magnitude with 0.5 V readout bias. Zr+-implanted-ZrO2 films exhibit good retention characteristics and high device yield. The impact of implanted Zr+ ions on resistive switching performances is investigated. Resistive switching of the fabricated structures is explained by trap-controlled space charge limited current conduction. (C) 2008 American Institute of Physics.
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