Surface and Interface Investigation of Liq/ITO by Using AFM and XPS

李建丰,孙硕,欧谷平,张福甲
DOI: https://doi.org/10.16818/j.issn1001-5868.2008.03.020
2008-01-01
Abstract:Liq was deposited on ITO coated glass by routine vacuum evaporation.The surface and interface of Liq/ITO were investigated by using atomic force microscopy(AFM) and X-ray photoelectron spectroscopy(XPS).The surface morphology of Liq was checked by AFM with an area of both in lateral and topographic force contact modes.XPS was introduced to study the interface electronic states of Liq/ITO.AFM results Liq grows as island shape,unwell-distributed and film quality of Liq on ITO was very rough with many cracks and pores.The analysis of surface of In3d and Sn3d spectrum by XPS provides additional evidence that the existence of cracks and pores in Liq,which can lead to heavy absorption of gas molecules.The spectrum of C1s indicates the existence of contaminated C atoms in the surface of ITO.The spectrum of N1s showed the interaction between N atoms and O,In and Sn atoms in the surface of ITO,which may affects the EL spectrum of Liq based OLEDs.
What problem does this paper attempt to address?