Effects of Diffusion Barriers on the Growth and Field Emission Properties of Carbon Nanotubes Using Copper Catalyst
Lili Wang,Yiwei Chen,Ting Chen,Tao Feng,Zhuo Sun,Wenxiu Que,Zhejuan Zhang,Lifeng Lin
DOI: https://doi.org/10.3969/j.issn.1005-9490.2008.01.057
2008-01-01
Abstract:Copper is a good catalyst besides Fe, Co, Ni for carbon nanotubes (CNTs) growth in field emis-sion display application, because the emission properties of as-grown CNTs on glass substrate afford low threshold field, high current density, and uniformity. Growing carbon nanotubes on glass substrate sur-face requires the formation of high-density catalyst nanoparticles. This, in turn, requires the minimum dif-fusion of catalyst into the substrate at the growth temperature for carbon nanotubes. Four metals (W, Ni,Cr and Ti) as the diffusion barrier have been optimized and examined for growing carbon nanotubes on glass substrate. The bilayer films were annealed at 550℃ in hydrogen gas for few minutes to form nanop-articles to grow CNTs under the atmosphere of C2H2/H2 by chemical vapor deposition (CVD) method.With an optimized barrier layer (Ti, or W), carbon nanotubes with excellent adhesion to the substrate and good field emission properties have also been achieved.