Fabrication of OLED ITO Transparent Electrode with Oxygen-free Sputtering Method

Wen-long JIANG,Yu DUAN,Shi-yong LIU
DOI: https://doi.org/10.3321/j.issn:1005-0086.2007.02.001
2007-01-01
Abstract:A method to generate double-side light-output organic light emitting devices (OLEDs) using oxygen-free sputtering target by R.F. magnetron reactive sputtering system has been presented. It is demonstrated that the method leads to a promising result in the fabrication of OLED. When the OLED structure is ITO (using oxygen-free sputtering target)/m-MTDATA (30 nm)/NPB(20 nm)/Alq3(50 nm)LiF(0.8 nm)/Al(100 nm), the maximum brightness and efficiency achieve 11 560 cd/m2 (V=25 V), and 2.52 cd/A(V=14 V) respectively. In the double-side light-output OLED, whose structure is ITO (commercial production)/m-MTDATA(30 nm)/NPB(20 nm)/Alq3(50 nm)LiF(0.8 nm)/Al(20 nm)/ITO(50 nm) (using oxygen-free sputtering target). The maximum brightness and efficiency measued from anode side attain 14460 cd/m2(V=18 V) and 2.16 cd/A(V=12 V) respectively, and these measured from cathode side are 1263 cd/m2(V=19 V), 0.26 cd/A(V=16 V).
What problem does this paper attempt to address?