Spin-ARPES EUV Beamline for Ultrafast Materials Research and Development
Zhonghui Nie,Ion Cristian Edmond Turcu,Yao Li,Xiaoqian Zhang,Liang He,Jian Tu,Zhiqiang Ni,Huangfeng Xu,Yequan Chen,Xuezhong Ruan,Fabio Frassetto,Paolo Miotti,Nicola Fabris,Luca Poletto,Jing Wu,Qiangsheng Lu,Chang Liu,Thorsten Kampen,Ya Zhai,Wenqing Liu,Cephise Cacho,Xuefeng Wang,Fengqiu Wang,Yi Shi,Rong Zhang,Yongbing Xu
DOI: https://doi.org/10.3390/app9030370
2019-01-01
Applied Sciences
Abstract:A new femtosecond, Extreme Ultraviolet (EUV), Time Resolved Spin-Angle Resolved Photo-Emission Spectroscopy (TR-Spin-ARPES) beamline was developed for ultrafast materials research and development. This 50-fs laser-driven, table-top beamline is an integral part of the “Ultrafast Spintronic Materials Facility”, dedicated to engineering ultrafast materials. This facility provides a fast and in-situ analysis and development of new materials. The EUV source based on high harmonic generation process emits 2.3 × 1011 photons/second (2.3 × 108 photons/pulse) at H23 (35.7 eV) and its photon energy ranges from 10 eV to 75 eV, which enables surface sensitive studies of the electronic structure dynamics. The EUV monochromator provides the narrow bandwidth of the EUV beamline while preserving its pulse duration in an energy range of 10–100 eV. Ultrafast surface photovoltaic effect with ~650 fs rise-time was observed in p-GaAs (100) from time-resolved ARPES spectra. The data acquisition time could be reduced by over two orders of magnitude by scaling the laser driver from 1 KHz, 4W to MHz, KW average power.