Abstract:ZnO thin films were prepared by radio frequency (RF) reactive magnetron sputtering at varying deposition conditions. The effects of RF power (from 40 to 90 W) and substrate temperature (from 100 to 200 degrees C) on the grain growth behavior, surface morphology evolution, and the structural and optical properties of the films were investigated. Atomic force microscopy (AFM) measurements confirmed that the grain size and surface roughness depend mainly on the RF power and increase with increasing it at the initial deposition stage of 5 s, and are strongly affected by the substrate temperature and increase with increasing it at the final deposition stage of 45 min. The influence of both the deposition parameters on the surface structure of the ZnO films at different deposition stages and the mechanism concerning this influence were discussed. The X-ray diffraction (XRD) and optical absorption spectra analysis indicated that all the films deposited for 45 min are in the state of the compressive stress and exhibit polycrystalline nature with the (002) preferential orientation, and they have high optical transparency in the visible range and sharp absorption edges around the wavelength 360 nm corresponding to the ZnO exciton. With the increase of the RF power and substrate temperature, the grain size increases, the residual compressive stress relaxes, and the optical band gaps broaden. In comparison with the RF power, the substrate temperature has more evident influence on the microstructure of the ZnO thin films.

Influences of Growth Temperature on the Crystalline Characteristics and Optical Properties for ZnO Films Deposited by Reactive Magnetron Sputtering

Effect of Nucleation and Growth Kinetics on the Electrical and Optical Properties of Undoped ZnO Films

Microstructure and Optical Properties of ZnO Films Deposited by Radio-frequency Reactive Magnetron Sputtering

STRUCTURAL AND OPTICAL STUDIES OF ZnO FILMS GROWN AT LOW TEMPERATURE

Growth Temperature Dependent Evolutions of Microstructural, Optical and Magnetic Properties of Zn0.75Co0.25O Films

Morphology and Interface Characteristics of ZnO Films Deposited at Room Temperature and 750 °C

Influences of Substrate Temperature on the Crystalline Characteristics and Optical Properties for ZnO Films Deposited on Freestanding Thick Diamond Films

Epitaxial Growth Of Zno On Gan/Sapphire Substrate By Radio-Frequency Magnetron Sputtering

Comparison of Structural and Optical Properties of ZnO Films Grown on Different Substrates at Low Temperatures

Structural and Optical Characterizations of ZnO Films Grown by Reactive Electron Beam Evaporation

Influence of Growth and Annealing Temperatures on Properties of ZnO Thin Films Prepared by RF Magnetron Sputtering

Influence of Substrate Temperature on the Structure and Optical Properties of ZnO Thin Films Grown by Pulsed Laser Deposition

Study of Zno Film Growth by Reactive Magnetron Sputtering Using Plasma Emission Spectra

Effect of the Variation of Temperature on the Structural and Optical Properties of ZnO Thin Films Prepared on Si (1 1 1) Substrates Using PLD

Grain Growth Behavior, Surface Morphology Evolution, Structures, and Optical Properties of Zno Thin Films Prepared by Rf Reactive Magnetron Sputtering

Effect of Growth Temperature on the Properties of ZnO Thin Films Prepared by L-MBE

Effects of Substrate Temperature on the Growth Orientation and Optical Properties of ZnO:Fe Films Synthesized Via Magnetron Sputtering

Crystallization Properties of ZnO Thin Films Synthesized by Plasma Enhanced Chemical Vapor Deposition

Influence of Deposition Temperature on the Crystallinity of Al-doped ZnO Thin Films at Glass Substrates Prepared by RF Magnetron Sputtering Method

Influence of Substrate Temperature on Structural and Optical Properties of ZnCdO Thin Films Deposited by Dc Magnetron Sputtering

Effect of the Growth Temperature on Zno Thin Films Grown by Plasma Enhanced Chemical Vapor Deposition