Development of Multilayer Optics for the EUV, Soft X-ray and X-ray Regions in Tongji University
Wang,Zhan-shan,Chuanhua Zhu,Jingtao,Hong-chang,Feng Li,Tongwen Chen,Lingyan
2005-01-01
Abstract:In EUV and X-ray regions, multilayer mirrors are the essential and necessary optics elements. The good prospects of the EUV and X-rays for next generation lithography system, microscopy in the water windows, astronomical telescope, spectroscopy, plasma diagnostics, and X-ray laser have impelled the development of multilayer optics. The paper introduces the recent results of the multilayer optics elements in Tongji University, including beam splitters, broadband/angular polarizers, supermirrors and high-reflectance mirrors. The product of reflectivity and transmissivity is above 4% for the Mo/Si multilayer beam splitter. Over the 15～17 nm wavelength range, the s-reflectivity of the non-periodic Mo/Si broadband multilayer polarizers is reasonably constant, as high as 36.6%, and the degree of polarization is more than 97.8%. At the fixed energy of 8 kev (Cu Kα line), the W/Si supermirror hasthe reflectivity of above 30% in the angle range of 0.4°～0.85°, and a W/B4C supermirror has the reflectivity of about 20% in the angle range of 0.9°～1.2°, and the reflectivity of W/C supermirror working in the grazing incident angle range of 0.9°～1.2° is about 20%. The experimental results of some high-reflectance mirrors in our lab are also presented, such as Mo/Si, Mo/Y, Cr/C, La/B4C, Si/C and Si/SiC. The reflectivity of Mo/Si multilayer is as high as 61.1%at wavelength of 13.4 nm.