Abstract:A method of designing multilayers with broadband wavelength responses for use as coatings in EUV optics at normal incidence is presented in this paper. The method is based on the well-known Fresnel equations and recursive calculation combined with a defined merit function, with random variation of the thickness of each layer. This allows the design of multilayers for specific requirements. The method was used to design Mo/Si multilayers with broadband wavelength responses for the EUV region, 18-20nm. Such mirrors were made by magnetron sputtering in 99.99% pure argon. The deposition rates, after calibration, were 0.12 nm s(-1) for molybdenum and 0.07 nm s(-1) for silicon. The broadband multilayers were deposited on 30 mm diameter K9 glass substrates with rms surface roughnesses less than 0.8 nm. For comparison, reference periodic multilayers with working wavelength of 19 nm were also deposited. X-ray reflectivity and diffraction measurements were made in theta -2 theta geometry using a D/Max-B X-ray diffractometer and Cu K alpha radiation. The results show that broadband and periodic multilayer mirrors have different performances which matched with simulation calculations. Ln order to improve the making technique, the combination of Rutherford backscattering spectroscopy with X-ray low-angle diffraction were used. We have also developed the equipment that can measure reflectivity qualitatively using a transmission grating spectrograph because of no reflectometer. The results showed that the wavelength responses of broadband multilayers were broader and the integrated reflectivities were higher than for periodic multilayers, but that the peak reflectivity was slightly lower.

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